Intel's first Intel 4 process node using EUV technology has been mass-produced

 


【Lansheng Technology News】Recently, Intel announced that it has begun mass production of Intel 4 process nodes using extreme ultraviolet lithography technology.


It is reported that as Intel's first process node produced using extreme ultraviolet lithography technology, Intel 4 has achieved significant improvements in performance, energy efficiency and transistor density compared with previous nodes. Extreme ultraviolet lithography technology is driving applications with the highest computing power requirements, such as AI, advanced mobile networks, autonomous driving, and new data centers and cloud applications.


Intel’s “Five Process Nodes in Four Years” plan is progressing smoothly. Currently, Intel 7 and Intel 4 have achieved large-scale mass production; Intel 3 is advancing as planned, with a target of the end of 2023; Intel 20A and Intel 18A, which use RibbonFET full surround gate transistor and PowerVia back power supply technology, are also progressing smoothly, with a target of 2024. In addition, Intel will soon launch the Intel 18A Process Design Kit (PDK) for Intel Foundry Services (IFS) customers.


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