ASML will launch a high-NA lithography machine for 2nm chip manufacturing in 2024 with a price of up to 300 million euros

 


【Lansheng Technology News】Currently, EUV lithography machines can support chip manufacturers to advance chip processes to about 3nm, but if they want to continue to advance to 2nm or even smaller sizes, they will need High-NA lithography machines with higher numerical aperture (NA).


It is reported that the lithography machine model used for 2-nanometer chips is the High-NA mass-production EUV lithography machine EXE:5200, which will use a different lens system with a larger NA. An ASML spokesperson once revealed that EXE:5200 is ASML's next-generation high NA system, which has higher lithography resolution and can reduce the chip by 1.7 times while increasing the density to 2.9 times.


Currently, there are only two EUV lithography machines listed on the ASML official website - NXE:3600D and NXE:3400C, both equipped with 0.33 NA reflective projection optics and 13.5nm EUV light source, suitable for 3/5nm and 5/ 7nm chip manufacturing.


Previously, media reported that ASML’s first 0.55 NA EUV lithography machine is planned to be mass-produced after 2025, and the first one will be delivered to Intel. Recently, it was reported that ASML has planned production capacity of only 10 units in 2024, and Intel has already reserved 6 of them. However, ASML plans to increase the production capacity of this equipment to 20 units per year in the next few years.


Intel has previously stated that it will be the first to obtain the industry's first High-NA EUV lithography machine. At the same time, Intel also revealed that the company has completed the development of Intel 18A (1.8nm) and Intel 20A (2nm) manufacturing processes. Among them, Intel 20A is planned to be put into use in the first half of 2024, and the Intel 18A manufacturing technology that is making good progress will also enter high-volume manufacturing (HVM) in the second half of 2024. The above-mentioned chip processes may partially utilize High-NA EUV lithography machines.


Currently, Samsung Electronics has been working hard to ensure the purchase of more EUV lithography equipment, with the goal of entering the second-generation process of the 3nm generation in the first half of 2024, the 2nm process in 2025, and the 1.4nm process in 2027.


TSMC has also stated very early that it will obtain ASML's new generation High-NA EUV lithography machine in 2024, and will also achieve mass production of 2nm chips in 2025.


It is reported that the price of ASML's latest High-NA EUV lithography equipment will be between 300 million and 350 million euros, while the current best-selling EUV lithography machine has a unit price of 150 million to 200 million US dollars.


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